Fontana Technology Assigned Patent

(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service ALEXANDRIA, Va., July 29 -- Fontana Technology, Campbell, Calif., has been assigned a patent (8,226,773) developed by Mark Jonathan Beck, Los Gatos, Calif., for a "method and composition for cleaning wafers." The abstract of the patent published by the U.S. Patent and Trademark Office states: "A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution." The patent application was filed on Dec. 8, 2008 (12/330,486). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,226,773&OS=8,226,773&RS=8,226,773 Written by Arpi Sharma; edited by Anand Kumar.

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