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TMCNet: U.S. Patents Awarded to Inventors in Connecticut (April 24)

[April 24, 2012]

U.S. Patents Awarded to Inventors in Connecticut (April 24)

(Targeted News Service Via Acquire Media NewsEdge) Targeted News Service Targeted News Service ALEXANDRIA, Va., April 24 -- The following federal patents were awarded to inventors in Connecticut.

*** Connecticut Inventor Develops Patent for Fuzzy Logic Control and Optimization System ALEXANDRIA, Va., April 24 -- Xinsheng Lou, West Hartford, Conn., has developed a patent (8,160,730) for a "fuzzy logic control and optimization system." The abstract of the patent published by the U.S. Patent and Trademark Office states: "A control system (300) for optimizing a power plant includes a chemical loop having an input for receiving an input signal (369) and an output for outputting an output signal (367), and a hierarchical fuzzy control system (400) operably connected to the chemical loop. The hierarchical fuzzy control system (400) includes a plurality of fuzzy controllers (330). The hierarchical fuzzy control system (400) receives the output signal (367), optimizes the input signal (369) based on the received output signal (367), and outputs an optimized input signal (369) to the input of the chemical loop to control a process of the chemical loop in an optimized manner." The patent application was filed on Feb. 27, 2009 (12/394,200). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,160,730&OS=8,160,730&RS=8,160,730 Written by Satyaban Rath; edited by Hemanta Panigrahi.

*** ASML Assigned Patent ALEXANDRIA, Va., April 24 -- ASML Holding, Veldhoven, The Netherlands, and ASML Netherlands, Veldhoven, The Netherlands, have been assigned a patent (8,159,651) developed by seven co-inventors for an "illumination system coherence remover with a series of partially reflective surfaces." The co-inventors are Huibert Visser, Zevenhuizen, The Netherlands, Jacob Fredrik Friso Klinkhamer, Delft, The Netherlands, Lev Ryzhikov, Norwalk, Conn., Scott D. Coston, New Milford, Conn., Adel Joobeur, Milford, Conn., Rob Vink, Delft, The Netherlands, and Yevgeniy Shmarev, Lagrangeville, N.Y.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam." The patent application was filed on Dec. 4, 2008 (12/328,204). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,159,651&OS=8,159,651&RS=8,159,651 Written by Satyaban Rath; edited by Hemanta Panigrahi.

*** ASML Assigned Patent for Lithographic Apparatus and Device Manufacturing Method ALEXANDRIA, Va., April 24 -- ASML Holding, Veldhoven, The Netherlands, and ASML Netherlands, Veldhoven, The Netherlands, have been assigned a patent (8,159,647) developed by four co-inventors for a "lithographic apparatus and device manufacturing method." The co-inventors are Arno Jan Bleeker, Westerhoven, The Netherlands, Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, The Netherlands, Peter C. Kochersperger, Easton, Conn., and Kars Zeger Troost, Waalre, The Netherlands.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system." The patent application was filed on July 9, 2008 (12/170,120). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,159,647&OS=8,159,647&RS=8,159,647 Written by Satyaban Rath; edited by Hemanta Panigrahi.

*** Boehringer Ingelheim International Assigned Patent ALEXANDRIA, Va., April 24 -- Boehringer Ingelheim International, Ingelheim am Rhein, Germany, has been assigned a patent (8,158,641) developed by four co-inventors for a 2-anilino-4-aminoalkyleneaminopyrimidines. The co-inventors are Jane Far-Jine Djung, Furlong, Pa., Adam Golebiowski, Madison, Conn., Jack A. Hunter, Loveland, Ohio, and Gary P. Schrum, Maineville, Ohio.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "The present invention relates to 2-arylamino-4-(aminoalkylene)aminopyrimidines inhibitors having the structure shown below: ##STR00001## wherein R and R.sup.1 are as defined herein. The 2-arylamino-4 -(aminoalkylene)aminopyrimidines inhibit Protein Kinase C-alpha (PKC-.alpha.). The PKC-.alpha. inhibitors of the present invention are important for improving myocardial intracellular calcium cycling, resulting in improved myocardial contraction and relaxation performance and thereby slowing the progression of heart failure. The present invention further relates to compositions comprising said 2-arylamino-4 -(aminoalkylene)amino-pyrimidines and to methods for controlling, abating, or otherwise slowing the progression of heart failure." The patent application was filed on March 26, 2009 (12/411,760). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,158,641&OS=8,158,641&RS=8,158,641 Written by Kusum Sangma; edited by Anand Kumar.

For more information about Targeted News Service products and services, please contact: Myron Struck, editor, Targeted News Service LLC, Springfield, Va., 703/304-1897; editor@targetednews.com; http://targetednews.com.

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